Over the recent years, advanced semiconductors industry has created an influential impact on high-k and ALD/CVD metal precursor market dynamics. urope is another region which is experiencing a significant coverage of global high-k and ALD/CVD metal precursor industry share in terms of revenue. The tremendous growth projection of the market can be credited to its wide manufacturing base of VLSI, which allows the prominence of metal precursor application in some of the memory devices including DRAMs (dynamic random access memory), CMOS, metal insulator metal diodes, ferroelectric logic etc.
The multitudinous demand for thin film materials in advanced semiconductor devices is expected to stimulate the High-k and ALD/CVD metal precursor market share. By undergoing the two processes- chemical vapor deposition(CVD) and atomic layer deposition (ALD), high-quality precursors are produced which are further used in the production of thin films. Rigorous ongoing research for the development of high-performance sophisticated precursors, as well as government investments in nanotechnology research, is anticipated to create lucrative opportunities for the market in the years ahead.
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In terms of regional landscape of High-k and ALD/CVD metal precursor market, Asia Pacific is one of the dominating players in the global scenario. China being the major revenue pocket for APAC market, held a 35% of the total revenue share in 2015. Driven by the growing end-use electronics product demand of the region, China High-k and ALD/CVD metal precursor industry is anticipated to continue its dominance in the regional market.
As per the estimates, Taiwan holds the largest consumer base of advanced semiconductor materials, which in turn is projected to have a parallel impact on the region’s High-k and ALD/CVD metal precursor market. In this regard, another significant move in the industry was the collaboration of Chemtura Corporation with UP chemical to strengthen their LED market concentrating around Asia Pacific, by producing high purity MO precursors.
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Based on metal precursor technology, the market is segmented into gates, interconnect, and capacitors. Interconnect High-k and ALD/CVD metal precursor market dominated the global demand in 2015 with an industry coverage of 45% of the total volume. With the evolution of power electronics incorporated with nonplanar transistors, nonvolatile memory chips, interconnect technology is in high demand. This segment dominated the technology landscape in 2015 accounting for 45% of the global demand.
High-k gate precursor industry also had a considerable share of the global revenue in 2015 having collected a revenue of USD 33 million in 2015. Owing to some of the attributing factors that these precursors provide such as high dielectric constant, chemical and thermal stability, compatibility with gate electrode, these metal precursors are replacing silicon oxide in CMOS (complementary metal oxide semiconductor). High-k and ALD/CVD metal precursor market based on gate technology are slated to witness a massive annual growth rate of 23% over the coming seven years.
Mergers and acquisitions along with competitive pricing remain the major business strategies adopted by the key market players. Some of the prominent participants operating in. high-k and ALD/CVD metal precursor market include Dow Chemical, Air Liquide, UP Chemical, and Adeka.
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